AUTOGLOW 200

Description

ㆍRIE or Plasma Processing
ㆍCleaning, Activation, Ashing or Etching
ㆍOxygen, Argon or CF4 gas
ㆍ300 Watts for Plenty of Power
ㆍProcess as Low as 10 Watts or as High as 300 Watts
ㆍPower control in one watt increments
ㆍModular RF Generator—easy to service
ㆍThe proprietary RF matching network and RF generator are designed
   to provide for minimal reflected power throughout the range 
   of power settings—this improves sample uniformity and the time
   to accomplish the processing task
ㆍChamber Pressure Display—so the operator can monitor chamber 
   pressure relative to gas flow
ㆍAutomatic Tuning—the operator can easily process samples without
   constant tweaking and adjustment of the system . Automatic Tuning.
ㆍAnodized Aluminum Chamber—allows for etching with CF4
ㆍSolid state electronics—no RF vacuum tubes for high reliability
   and rugged design

OPTIGLOW ACE

Description

ㆍRIE or Plasma Processing
ㆍAshing, Cleaning, Etching
ㆍOxygen, Argon or CF4 gas
ㆍ150 Watts for Plenty of Power
ㆍProcess as Low as 10 Watts or as High as 150 Watts
ㆍPower is adjustable in one watt increments.
ㆍModular RF Generator—easy to remove
ㆍThe proprietary RF matching network and RF generator are designed 
   to provide for minimal reflected power throughout the range 
   of power settings—this improves sample uniformity and the time 
   to accomplish the processing task
ㆍPressure output reading—so the operator can monitor chamber 
   pressure relative to gas flow
ㆍNo tuning required—the operator can easily process samples without
   constant tweaking and adjustment of the system . Automatic Tuning.
ㆍAnodized Aluminum Chamber—allows for etching with CF4
ㆍSolid state electronics—no RF vacuum tubes for high reliability 
   and rugged design